研究目的
Investigating the high-temperature rectifying and UVC sensing properties of oxidized ruthenium (RuOx) Schottky contacts on β-Ga2O3 for stable high-temperature operation.
研究成果
RuOx:β-Ga2O3 Schottky contacts showed very strong high-temperature performance with rectification ratios of >1010 and leakage current densities of less than 10-9 Acm-2, during repeated operation at 350 oC. This enables them to act as sensitive high-temperature UVC detectors, with UVC/dark current ratios of ~103 at 350 oC.
研究不足
The UVC transparency of the ~60 nm thick Ru-capped RuOx SCs was < 2.5 %, indicating significant scope for increasing their responsivity by using thinner uncapped RuOx layers and/or an interdigitated contact design.
1:Experimental Design and Method Selection:
Fabrication of RuOx Schottky contacts on β-Ga2O3 single crystal substrates using reactive rf sputtering.
2:Sample Selection and Data Sources:
Unintentionally-doped single-crystal 201 β-Ga2O3 substrate from Tamura Corp. Japan.
3:List of Experimental Equipment and Materials:
HP4155A Parameter Analyzer, Boonton 7200 Capacitance Meter, Ru target (
4:95 % purity), O
Ar plasma.
5:Experimental Procedures and Operational Workflow:
Ultrasonic cleaning of substrate, deposition of RuOx SCs, fabrication of Ti/Au ohmic contacts, high-temperature performance evaluation using J-V-T and C-V-T measurements.
6:Data Analysis Methods:
Analysis of J-V-T and C-V-T characteristics using thermionic emission theory and capacitance-voltage relationship.
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