研究目的
To explore state-of-the-art cleavable photoresists for 3D direct laser writing, discussing their design, feature resolution, cleavage properties, and potential to combine additive and subtractive manufacturing in a hybrid technology.
研究成果
The paper concludes that cleavable direct-laser-written microstructures have great potential for various applications, despite existing challenges. It emphasizes the need for expanding the toolbox of accessible cleavage triggers and investigating overall suitability for specific applications.
研究不足
The paper identifies challenges such as the need for elevated temperature or organic solvents for complete degradation of some cleavable microstructures, and the limited exploration of key properties like feature resolution, toxicity of degraded products, or mechanical stability.