研究目的
To present the fabrication process of pedestal based optical waveguides using materials with large optical nonlinearities as core layer for applications in nonlinear optics.
研究成果
The study concludes that Aluminum Nitride and Titanium oxynitride pedestal waveguides have been successfully fabricated for integrated Nonlinear Photonics applications. The materials show potential for nonlinear photonics, but further characterization and engineering are needed to optimize their performance for specific applications.
研究不足
The study mentions that the optical losses of the waveguides still need to be characterized, and future work includes measuring the nonlinear index of the materials and performing appropriate dispersion engineering of the waveguides.
1：Experimental Design and Method Selection:
The study focuses on the fabrication of pedestal based optical waveguides using Reactive Ion Etching (RIE) for the lower cladding and deposition of core materials (Aluminum Nitride and Titanium oxynitride films) without the need for etching the core layer itself.
2：Sample Selection and Data Sources:
The waveguides are fabricated on a p-type single-crystal silicon wafer with (100) crystallographic orientation. Materials used as core layer are Aluminum Nitride and Titanium oxynitride films.
3：List of Experimental Equipment and Materials:
Includes a thermal silicon dioxide film, AZ-1518 resist, Buffered Oxide Etchant (BOE) solution, Reactive Ion Etching (RIE) system, and a profilometer (Tencor, Alpha Step 500).
4：0).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The process involves the growth of a thermal silicon dioxide film, photolithography, etching of the silicon dioxide film, RIE etching of the silicon substrate, wet oxidation, and deposition of the core material.
5：Data Analysis Methods:
Optical transmittance measurements, Raman spectroscopy, and Scanning Electron Microscopy (SEM) are used to characterize the films and waveguides.
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