研究目的
Investigating the layer-dependent optoelectronic properties of 2D van der Waals SnS grown by pulsed laser deposition for applications in next-generation optoelectronic devices.
研究成果
The study demonstrates that 2D SnS grown by PLD exhibits excellent electrical and optical properties, making it a promising material for next-generation optoelectronic devices. The layer-dependent properties highlight the potential for tuning device performance by controlling the number of SnS monolayers.
研究不足
The study focuses on the layer-dependent properties of SnS but does not explore the scalability of the PLD method for industrial applications or the long-term stability of the devices.
1:Experimental Design and Method Selection:
The study employs pulsed laser deposition (PLD) to grow 2D SnS films on Si/SiO2 substrates, followed by fabrication of FETs and photodetectors to study their electrical and optical properties.
2:Sample Selection and Data Sources:
SnS films of varying thicknesses (2–25 monolayers) are prepared by controlling the number of laser shots.
3:List of Experimental Equipment and Materials:
A KrF excimer laser for PLD, Si/SiO2 substrates, Ti/Au electrodes for device fabrication, and various characterization tools including AFM, HRTEM, XRD, Raman spectroscopy, XPS, UV–Vis–NIR spectroscopy.
4:Experimental Procedures and Operational Workflow:
SnS films are deposited, annealed, and characterized. FETs and photodetectors are fabricated and their performance is measured under different conditions.
5:Data Analysis Methods:
Electrical and optical properties are analyzed using standard semiconductor device physics and spectroscopy techniques.
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Atomic force microscope
Dimension Edge
Bruker Corporation
Used to measure the thickness of SnS films.
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UV–Vis–NIR spectrophotometer
Cary Series UV–Vis–NIR spectrophotometer
Agilent Technologies
Used to measure the optical transmittance of SnS films.
Cary 60 UV-Vis Spectrophotometer
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KrF excimer laser
Used for pulsed laser deposition of SnS films.
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Si/SiO2 substrates
Used as the substrate for SnS film deposition and device fabrication.
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Ti/Au electrodes
Used as source and drain electrodes in FET fabrication.
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High-resolution transmission electron microscope
FEI, F20
Used to obtain cross-section morphology images of SnS films.
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X-ray diffractometer
Panalytical Empyrean
Used to study the phase of SnS films.
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Raman spectrophotometer
Bruker Senterra
Used for Raman spectroscopy of SnS films.
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X-ray photoelectron spectrometer
Kartos, AXIS supra
Used to characterize the surface composition and chemical states of Sn and S in SnS films.
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Semiconductor device analyzer
Agilent E5270B
Used to measure the I-V characteristics of fabricated FETs.
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