研究目的
To present a novel obfuscation technique based on the concepts of cloaked nets and fake holographic gates using metasurface holography to protect semiconductor IPs against optical and X-ray imaging based Reverse Engineering.
研究成果
The paper presents a novel IC obfuscation technique based on metasurface holography that significantly increases the difficulty of reverse engineering semiconductor IPs. By projecting fake gates and cloaking real nets, the technique ensures that attackers recover a partially incorrect netlist, making the RE effort considerably higher than conventional camouflaging methodologies.
研究不足
The technique's effectiveness is primarily against optical and X-ray imaging based RE. The fabrication of metasurfaces requires additional process steps and masks, which could increase the complexity and cost of IC manufacturing.
1:Experimental Design and Method Selection:
The paper introduces the concept of Holographic gates and cloaked nets for logic obfuscation and utilizes metasurface holography to project fake gates and cloak real nets.
2:Sample Selection and Data Sources:
The methodology is demonstrated through simulations and theoretical models, without specific sample selection.
3:List of Experimental Equipment and Materials:
Metasurface layers (MS1/MS2) with nano-antennas are used for projecting holograms and cloaking interconnects.
4:Experimental Procedures and Operational Workflow:
The process involves fabricating metasurface layers on ICs to project fake gates and cloak real nets, followed by optical or X-ray imaging to evaluate the obfuscation.
5:Data Analysis Methods:
The effectiveness of the obfuscation is analyzed through simulations and theoretical models, comparing original and obfuscated netlists.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容