摘要： Rhenium disulfide (ReS2) is a transition metal dichalcogenide with a layer-independent direct bandgap. Notably, the weak interlayer coupling owing to its T-phase structure enables multi-layer ReS2 to behave similarly to decoupled monolayers. This inherent characteristic makes continuous multi-layer ReS2 film a unique platform for large-area electronic applications. To date, the bulk of work on ReS2 has been conducted using mechanically exfoliated samples or small size flakes (< 1mm2) with no potential for large-scale electronics. A chemical vapor deposition (CVD) synthesis of a large area, continuous ReS2 film directly on a SiO2 substrate is also known to be more challenging compared with that of other 2D materials, such as MoS2 and WS2. This is partly due to its tendency to grow into discrete dendritic structures. In this study, a large-area (> 1 cm2), continuous multilayer ReS2 film is directly synthesized on a SiO2 substrate without any transfer process. The polycrystalline ReS2 film synthesized by this method exhibits one of the fastest photoresponse speeds (0.03 s rise time and 0.025 s decay time) among the reported CVD films. The responsivity Rλ was also the highest among large-area CVD films. The synthesis method for a continuous multilayer ReS2 film is amenable to large-scale integration and will pave the way for practical optoelectronic applications based on 2D layered materials.