摘要： Increasing extreme ultraviolet (EUV) photon power in laser-produced plasma (LPP) sources is critically important for e?cient future nanolithography devices. Enhancing the lifetime of the optical collector system in these devices is another important challenge for reliable and economically feasible devices. In this work, various mechanisms a?ecting ion acceleration in LPP were investigated to predict the maximum ion energies and ?ux arriving at the collecting mirror surfaces. Plasma evolution produced by an Nd:YAG laser from Sn targets was studied in detail to predict the dynamics of EUV producing ions and their contribution to the EUV power. The multiphysics fully 3D integrated HEIGHTS computer package was used in this analysis. HEIGHTS simulations of detail plasma evolution and ion kinetic energies were compared with various worldwide experimental data. Excellent agreement was shown regarding the range of ion kinetic energies and their angular distribution as well as recombination processes and their e?ect on the temporal output of EUV photons. Spatial and charge distributions were predicted for EUV producing ions and ionic debris. The analysis showed that mainly two Sn ions, i.e., Sn XII and Sn XIII, determine the EUV source intensity and spatial location. It was also shown that reducing the laser spot size and increasing the pulse duration allow a signi?cant reduction in ion kinetic energies that is important for a longer lifetime of the optical collection system.