摘要： Plasmonic lithography based on surface plasmon polariton has been proven to breaking the diffraction limit and deliver the super-resolution patterns. However, most previously reported studies suffer from the low energy efficiency and subwavelength excitation grating which obstruct the application in nanofabrication. In this work, a special plasmonic lithography prototype is proposed based on the coupling of the bulk plasmon polariton (BPP) mode squeezed through the hyperbolic metamaterial (HMM) and the waveguide mode supported in the Coupling layer/HMM/PR (photoresist) sandwich structure. The results demonstrate that periodic patterns with strong lithography light intensity (>220%) over the whole photoresist layer compared with incident optical intensity, high aspect ratios (1.5:1) and a half-pitch of 57.5 nm can be generated, under the interference of the fourth-order diffracted light of grating. The lithography linewidth can reach 1/16 of the mask period of 920 nm and ~1/8 of the wavelength of the 436nm illumination light. This design of period reduction makes the device fabrication much easy, costless and even exhibits good tolerant to the roughness of the multilayer. In addition, theoretical analyses performed are widely applicable to systems working at other ultraviolet wavelengths including 248, 365 and 405 nm.