研究目的
To develop a compact, desktop-scale CVD growth system for reliable and programmable CNT growth through computer-controlled fully automated operation.
研究成果
The developed computer-controlled compact CVD system enables programmable growths of CNTs with desired height, density, and pattern architecture, facilitating practical developments of many applications utilizing CNTs and their derivative architectures.
研究不足
The system does not include vacuum processing components, which may limit its use for processes requiring vacuum conditions.
1：Experimental Design and Method Selection:
The system was designed to carry out the APCVD process with precise controls of parameters without excessive parts. Essential components include the heating chamber, four mass flow controller (MFC) channels, and the computer controller.
2：Sample Selection and Data Sources:
Catalyst layers comprising Fe on Al2O3 were deposited on a SiO2-coated Si wafer.
3：List of Experimental Equipment and Materials:
1''-diameter single-zone tube furnace, four MFC channels designated for Ar, H2, C2H4, and air, and computer controller.
4：Experimental Procedures and Operational Workflow:
The chamber is heated up to the peak temperature under Ar/H2 flowing, dwelled for catalyst annealing, then C2H4 is added for CNT growth. After growth, the chamber is cooled down under Ar flowing.
5：Data Analysis Methods:
The growth results were evaluated by SEM imaging to confirm the controlled height, density, and pattern of CNTs.
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