研究目的
To investigate the optoelectronic properties of photodetectors fabricated from silicon germanium alloy, focusing on conduction mechanism, activation energy, photoconductivity, detectivity, and Hall measurement.
研究成果
The use of amorphous silicon and germanium is a cost-effective alternative for photodetector fabrication. The study confirmed Poole-Frenkel type conduction mechanism, dependency of activation energy on germanium percentage, and improved optoelectronic properties with increased germanium content. Samples with higher germanium content showed better diode effect and detectivity.
研究不足
The study is limited to the investigation of amorphous silicon germanium photodetectors fabricated using thermal vacuum evaporation technique. The effects of different fabrication techniques and materials were not explored.