研究目的
Investigating the chemical vapor deposition (CVD) growth behavior of hexagonal WS2 monolayers using WS2 powders and sodium triosulfate (Na2S2O3) as precursors.
研究成果
The study successfully prepared WS2 layers by CVD with WS2 and Na2S2O3 as precursors, observing significant effects of Na2S2O3 on film growth. Triangular and leaf-like shapes of WS2 film were obtained, with growth mechanisms discussed based on S-termination and W-termination theory. The findings provide guidance for future large-scale 2D material growth.
研究不足
The study is limited by the complexity of the CVD growth mechanism of WS2 and the unclear role of sodium ions in the process. Potential areas for optimization include the control of experimental parameters for more uniform and larger-scale WS2 film growth.
1：Experimental Design and Method Selection:
The study utilized a CVD method with WS2 powders and Na2S2O3 as precursors in Ar/H2 atmosphere to grow WS2 monolayers.
2：Sample Selection and Data Sources:
Silicon wafer with 300 nm of oxide layer (SiO2/Si) was used as the growth substrate.
3：List of Experimental Equipment and Materials:
A tube furnace and vacuum system, quartz boat, WS2 powders, solid Na2S2O3, and SiO2/Si substrate.
4：Experimental Procedures and Operational Workflow:
The furnace tube was heated to specific temperatures with Ar/H2 flow, sealed at atmospheric pressure, and kept at the temperature for a set time before cooling.
5：Data Analysis Methods:
Optical and photoluminescence imaging, scanning electron microscopy, and Raman and PL spectra analysis were conducted.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
tube furnace
Used for heating the precursor materials to grow WS2 monolayers.
-
vacuum system
Used to create a controlled atmosphere for the CVD process.
-
quartz boat
80 (cid:1) 10 mm
Used to hold the precursor materials during the CVD process.
-
SiO2/Si substrate
100 (cid:1) 15 mm
Used as the growth substrate for WS2 monolayers.
-
Jiangnan MV3000 digital microscope
MV3000
Jiangnan
Used for optical imaging of WS2 layers.
-
Nib400 fluorescence microscope
Nib400
Jiangnan Novel Optics Co., Ltd.
Used for photoluminescence imaging of WS2 layers.
-
desktop scanning electron microscope
COXEM EM-30 AX Plus
COXEM
Used for scanning electron microscopy of WS2 layers.
-
Raman spectrometer
iHR320
Horiba
Used for acquiring Raman spectra of WS2 layers.
-
CCD camera
Syncerity
Horiba
Used in conjunction with the Raman spectrometer for data acquisition.
-
semiconductor laser
Used as a light source for Raman spectroscopy.
-
登录查看剩余8件设备及参数对照表
查看全部
