研究目的
To study and analyze the grating structure and its performance for coupling between fiber and silicon-based waveguide, and to optimize the fabrication process of grating couplers.
研究成果
The coupling efficiency of grating coupler is simulated and optimized. The physical and alignment parameters have an obvious influence on coupling efficiency. The fabrication process is continuously optimized to reduce manufacturing tolerance, which is of great significance for further research and fabrication of vertical grating coupler.
研究不足
The fabrication process has uncertainties that lead to deviations between the measured and designed values. The influence of process parameters such as exposure mode, exposure time, etching rate, and etching method on manufacturing tolerance needs further discussion.
1：Experimental Design and Method Selection:
The coupling mechanism is illustrated through the grating Bragg diffraction condition, and the effect of physical parameters and alignment parameters of the grating coupler on the coupling efficiency is analyzed by FDTD (Finite-difference time-domain).
2：Sample Selection and Data Sources:
Silicon-based waveguide with high refraction index contrast is used.
3：List of Experimental Equipment and Materials:
EBL (Electron Beam Lithography) and Deep Silicon Etching are used for fabrication.
4：Experimental Procedures and Operational Workflow:
The physical parameters (grating period, duty cycle, and etching depth) and alignment parameters (coupling angle, horizontal position, and vertical height of fiber core) are scanned and optimized.
5：Data Analysis Methods:
The coupling efficiency is analyzed based on the simulation results.
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