研究目的
Investigating the influence of dopant concentration on the electronic band gap energy of Yb-ZrSe2 thin films for photovoltaic applications.
研究成果
The Yb-ZrSe2 thin films fabricated via electrochemical deposition technique are polycrystalline and show potential for photovoltaic applications due to their optical and structural properties. The optical band gap energy was found to be 1.57 eV, making it a promising material for solar cells.
研究不足
The study focuses on the influence of dopant concentration on the electronic band gap energy but does not explore the long-term stability or scalability of the Yb-ZrSe2 thin films for photovoltaic applications.
1:Experimental Design and Method Selection:
Electrochemical deposition technique was used for the synthesis of undoped and doped ZrSe2 thin films. The FTO coated substrate served as the working electrode.
2:Sample Selection and Data Sources:
Fluorine-doped tin oxide (FTO) glass substrates were used.
3:List of Experimental Equipment and Materials:
UV-1800 Visible Spectrophotometer, Bruker D8 Advance x-ray diffractometer, Scanning Electron Microscopy, zirconium (IV) oxychloride octahydrate (ZrOCl
4:8H2O), selenium powder (Se), hydrochloric acid (HCl), ytterbium nitrate penta-hydride (Yb (NO3)5H2O). Experimental Procedures and Operational Workflow:
The substrates were cleaned and dried before deposition. The deposition was carried out under a potentiostatic condition of ?200 mV versus SCE for 10 min.
5:Data Analysis Methods:
The structural characterization was carried out using x-ray diffractometer, morphological and quantitative analysis using SEM and EDX, and optical properties using UV-visible spectrophotometer.
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Bruker D8 Advance x-ray diffractometer
D8 Advance
Bruker
Used for structural characterization of the films.
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UV-1800 Visible Spectrophotometer
UV-1800
Used for optical properties analysis of the films.
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Scanning Electron Microscopy
Used for morphological and quantitative analysis of the films.
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Fluorine-doped tin oxide (FTO) glass substrates
Used as the substrate for film deposition.
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zirconium (IV) oxychloride octahydrate
ZrOCl2.8H2O
Used as the cationic precursor.
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selenium powder
Se
Used as the anionic precursor.
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Hydrochloric acid
HCl
Used to dissolve selenium powder.
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ytterbium nitrate penta-hydride
Yb (NO3)3.5H2O
Used as the dopant.
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