研究目的
Investigating the fabrication of wetting layer-free, ultrathin plasmonic gold films with enhanced optoelectronic properties by deposition on substrates cooled to cryogenic temperatures.
研究成果
Substrate cooling suppresses the Vomer-Webber growth mode of Au, enabling the formation of ultrathin continuous Au films with enhanced optoelectronic properties and improved surface morphologies. Wetting layer-free, plasmonic Au films down to 2.95 nm thickness were achieved, paving the way for their use in optoelectronic and plasmonic devices, as well as metamaterials and metasurfaces.
研究不足
The study focuses on Au films deposited on fused-silica substrates, and the applicability to other substrates or materials is not explored. The effect of substrate cooling on film properties is systematically studied, but the underlying mechanisms could be further investigated.
1：Experimental Design and Method Selection:
Ultrathin Au films were deposited on fused-silica substrates at temperatures ranging from room temperature (23 °C) down to liquid nitrogen temperature (-195 °C) using magnetron sputtering in a high-vacuum chamber.
2：Sample Selection and Data Sources:
500 μm thick fused-silica substrates were used.
3：List of Experimental Equipment and Materials:
Magnetron sputtering chamber, fused-silica substrates, ultrapure Argon, cold finger for temperature control.
4：Experimental Procedures and Operational Workflow:
Substrates were cooled to target temperatures, Au was deposited at a rate of
5：5 nm/s, and samples were characterized using spectroscopic ellipsometry, SEM, AFM, and four-point probe method. Data Analysis Methods:
Spectroscopic ellipsometry data was analyzed using CompleteEASE software, and surface morphology was assessed via SEM and AFM imaging.
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