研究目的
To explore the impact of a small topography (~200 nm) generated by an insulating photoresist, used to partition OLED pixels, onto thin-?lm encapsulated top-emitting OLED performances.
研究成果
The semi-transparent top electrode of OLEDs, 15 nm-thick Ag, shows a strong thickness decrease, together with a low ?lm density, on tapered angle regions of the photoresist used to partition pixels. This leads to a critical increase of Ag ?lm resistivity and to a poor stability of topographic devices compared to planar ones.
研究不足
The study is limited to the impact of topography on OLED performances and does not explore alternative materials or architectures that might mitigate the observed effects.
1:Experimental Design and Method Selection:
Planar and topographic green top-emitting OLED architectures, with and without an Al2O3 thin-?lm encapsulation, have been explored.
2:Sample Selection and Data Sources:
OLED devices have been fabricated onto 200 mm silicon substrates with Al:Cu (~200 nm) /TiN (~7 nm) as a bottom re?ective anode.
3:List of Experimental Equipment and Materials:
MA8 mask aligner system from Suss MicroTec, Sunicel plus 200 deposition cluster tool from Sunic Systems Ltd, Savannah 200 system from Cambridge Nanotec/Veeco.
4:Experimental Procedures and Operational Workflow:
The device pattern was such that 135 OLED devices could be made at the same time onto one single wafer, one half leading to planar devices, and the other half to topographic ones.
5:Data Analysis Methods:
Measurements of Current density-Voltage-Luminance (JVL) have been carried out using a Keithley generator and a PR655 spectrophotometer from Photo Research.
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Savannah 200 system
Savannah 200
Cambridge Nanotec/Veeco
Used for the deposition of Al2O3 barrier layer by ALD at 90 °C.
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Olympus BX 51 optical microscope
BX 51
Olympus
Used to capture images of OLEDs.
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Tecnai OSIRIS equipment
Tecnai OSIRIS
FEI
Used for cross-sectional Scanning Transmission Electron Microscopy (STEM) measurements.
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MA8 mask aligner system
MA8
Suss MicroTec
Used to de?ne the insulating photoresist pattern onto the patterned electrode.
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Sunicel plus 200 deposition cluster tool
Sunicel plus 200
Sunic Systems Ltd
Used for the deposition of all organic layers in sequence by vacuum evaporation.
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Keithley generator
Keithley
Used for measurements of Current density-Voltage-Luminance (JVL).
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PR655 spectrophotometer
PR655
Photo Research
Used for measurements of Current density-Voltage-Luminance (JVL).
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In?nity 2 CCD camera
In?nity 2
Lumenera
Mounted on the Olympus BX 51 optical microscope for image capture.
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