研究目的
Developing a membrane BH DFB III-V/Si laser using a stopband-modulated cavity on Si substrate for high-capacity optical transmitters.
研究成果
The developed membrane BH DFB III-V/Si laser demonstrates single-mode lasing with a narrow linewidth and high output power, suitable for integration on standard Si photonics platforms. Extending the active region length reduces thermal impedance, enabling higher output power and high-temperature operation.
研究不足
The maximum output power is limited by self-heating, and the fabrication of gratings with shallow and small apertures on the Si waveguide is sensitive to grating characteristics.
1:Experimental Design and Method Selection:
The study employs a membrane BH DFB laser design with a stopband-modulated cavity on a Si substrate, utilizing a uniform grating and width-modulated Si waveguide.
2:Sample Selection and Data Sources:
The experiments are conducted on fabricated membrane III-V/Si BH DFB lasers with varying active region lengths.
3:List of Experimental Equipment and Materials:
Includes a silicon-on-insulator (SOI) substrate, InP substrate with InGaAsP-based MQWs, SiN grating, and metal electrodes.
4:Experimental Procedures and Operational Workflow:
Fabrication involves wafer bonding, epitaxial growth, grating formation, and device characterization under continuous-wave operations.
5:Data Analysis Methods:
Characterization includes measuring output power versus injection current, lasing spectrum, frequency noise spectrum, and thermal impedance.
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SOI substrate
Used as the base material for fabricating the Si waveguide.
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InP substrate
Used for the InGaAsP-based MQWs.
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SiN grating
Used for the uniform grating on the top-surface of the III-V layer.
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HNAF
Used for physically connecting to the SiOx waveguides for device characterizations.
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Optical isolator
Used for eliminating reflections from the connectors and equipment.
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Peltier cooler
Used for controlling the stage temperature.
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Frequency noise analyzer
OE4000
OEWaves, Inc.
Used for measuring the frequency noise spectrum to estimate the Lorentzian linewidth of the fabricated laser.
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