研究目的
Investigating the design, fabrication, and optical characterization of on-chip 90° corner waveguide arrays based on ultra-long-range surface plasmon polariton waveguides for single-mode high-speed communication interconnects.
研究成果
The study successfully demonstrates the fabrication and optical characterization of on-chip 90° waveguide corner mirrors based on ultra-long-range surface plasmon polariton waveguides. The waveguides show typical propagation loss of ~1 dB/mm, and simulations suggest an optimal design could achieve a transmission ratio of 95%. The fabrication method using self-alignment and multi-step lithography is simpler and more accurate than traditional alignment methods.
研究不足
The fabrication process requires precise alignment of multiple lithography steps, and the optical characterization setup could not measure the loss of the corner waveguides directly. The propagation loss varies with waveguide width, and there is observed light diffusion around the corner.
1：Experimental Design and Method Selection:
The study involves the design and simulation of ultra-long-range surface plasmon polariton waveguides with integrated 90° corner mirrors, followed by fabrication using a self-alignment method of multiple lithography steps.
2：Sample Selection and Data Sources:
The samples are fabricated on silicon wafers with SU-8 claddings and gold-photoresist cores.
3：List of Experimental Equipment and Materials:
Includes SU-8 photoresist, gold for the waveguide core, and a Plassys MEB400 thermal evaporator for gold deposition.
4：Experimental Procedures and Operational Workflow:
The fabrication process involves deposition of lower SU-8 cladding, gold deposition, UV lithography for waveguide definition, and deposition of upper SU-8 cladding with integrated prismatic cavity.
5：Data Analysis Methods:
Optical characterization is performed using 1.55 μm TM-polarized light, with propagation and coupling losses measured using the cut-back method.
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