研究目的
Investigating the ultraviolet photoresponse in MgZnO thin films by proposing a model based on the evolution of electron and surface charge density.
研究成果
The proposed model successfully simulates the photocurrent decay in MgZnO thin films by considering changes in both electron density and conductive volume due to UV illumination. Higher oxygen pressure during deposition leads to faster response, higher UV to visible rejection ratio, and higher ON/OFF ratio, attributed to decreased surface charge density and background donor density.
研究不足
The study is limited to MgZnO thin films and does not explore other materials. The model's applicability to other semiconductor materials or different deposition methods is not verified.
1:Experimental Design and Method Selection:
The study involves the deposition of MgZnO thin films on Al electrodes by pulsed laser deposition at different oxygen pressures to investigate the UV photoresponse.
2:Sample Selection and Data Sources:
MgZnO thin films were deposited on glass substrates with varying oxygen pressures to alter the oxygen vacancy concentration.
3:List of Experimental Equipment and Materials:
A KrF excimer laser for PLD, Al electrodes, and MgZnO targets with varying Mg concentrations were used.
4:Experimental Procedures and Operational Workflow:
The films were characterized using UV-vis transmission spectra, X-ray diffraction, and I-V measurements under dark and UV illumination conditions.
5:Data Analysis Methods:
The temporal variation of photocurrent was modeled by considering changes in both conducting volume and electron density.
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