研究目的
To solve the problem of interference fringes occurring in the homogenized light spot due to the periodicity of the MLA, which seriously affects the uniformity of the homogenized light spot, by proposing a novel random microlens array (rMLA) structure for achieving beam homogenization.
研究成果
The paper proposed a method of combining chemical etching with lithography technology to prepare the random microlens array (rMLA) to break the periodicity of the MLA, suppress the coherence during the homogenization process and obtain a homogenized light spot with high energy utilization. Through measurement, the uniformity of the circular light spot was about 81%, while the rectangular light spot was about 88%. The energy utilization rate of the homogenized light spots by the two types of rMLAs was about 90%. The designed rMLA can be expected to be used in laser welding machines, medical treatment, exposure machine lighting systems and other fields.
研究不足
The fabrication technology of continuous rMLA is not yet mature. The surface of the fabricated rMLA by the fundamental chemical etching solution is not smooth, with a roughness of 106 nm, which generates a lot of stray light during the beam homogenization process, seriously affecting the uniformity of the homogenized light spot.
1:Experimental Design and Method Selection:
A novel random microlens array (rMLA) structure was proposed for beam homogenization. The coherence in the homogenization process is suppressed by breaking the periodicity of the MLA. A method combining chemical etching with lithography technology was used to fabricate a honeycomb rMLA and a rectangular rMLA.
2:Sample Selection and Data Sources:
Ultra-white glass was selected as the substrate material. The main component of the selected substrate is SiO2, with a content of 73%.
3:3%.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Three different chemical etching solutions were fabricated. The compositions of the chemical etching solution included deionized water, hydrofluoric acid solution (HF solution) (40%) and ammonium fluoride particles (NH4F), called the fundamental chemical etching solution. The proportion of ingredients was 10:3:
4:Experimental Procedures and Operational Workflow:
The fabrication requires the pretreatment of the surface of the glass substrate—that is, the random micropores array with different structures needs to be fabricated on the surface of the substrate. For the fabrication of the honeycomb rMLA, a chromium film with a thickness of about 140 nm was first coated on a glass substrate. The glass substrate was then put into the chromium removal solution and soaked for 10 s to etch a series of random micropores on the chromium film. The preprocessed substrate was put into the chemical etching solution to fabricate the honeycomb rMLA.
5:Data Analysis Methods:
The uniformity of the light spot was calculated by using a specific equation, where the uniformities of the circular spot and the rectangle spot were about 81% and 88%, respectively. The power of the input beam measured with the power meter was about 3.5 mW, and the output powers after passing through the honeycomb rMLA and the rectangular rMLA were all about 3.2 mW.
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