研究目的
To develop a simple and precise method for micro-patterning PANI without the use of additives or stabilizers, using a low power CW laser through the laser-induced microbubble technique (LIMBT).
研究成果
The LIMBT method enables high-resolution printing of conductive PANI without additives, achieving conductivities comparable to state-of-the-art methods. The technique offers control over the width of the printed lines down to sub-micron levels, presenting a viable alternative for microfabrication of conductive polymers.
研究不足
The method's sensitivity to disturbances can lead to discontinuity in the formed pattern, especially at lower laser powers and higher stage velocities. The dense structure of the deposited lines limits the doping to small acid molecules.
1:Experimental Design and Method Selection
The methodology involves using a focused laser beam absorbed by EB-PANI nanoparticles to form a microbubble, followed by convection currents that pin the nanoparticles to the substrate.
2:Sample Selection and Data Sources
EB-PANI nanoparticles dispersed in NMP were used as samples. Cryo-TEM measurements were conducted to determine the structure of EB-PANI prior to deposition.
3:List of Experimental Equipment and Materials
A 532 nm CW laser, inverted microscope with a 40X objective lens, power meter, optical beam shutter, DeltaPix camera, SEM (Quanta FEG 250 System, FEI, Magellan 400L system), micro-Raman spectra (HR 800 Jobin Yvon system), cryo-TEM (Tecnai G2, FEI system), optical profilometer (LEXT, OLS4100, Olympus).
4:Experimental Procedures and Operational Workflow
The laser beam was focused on the EB-PANI dispersion/substrate interface to form a microbubble. The stage was moved to form continuous micro-patterns. The deposited patterns were then doped with various acid solutions to transform them into the conductive ES-PANI form.
5:Data Analysis Methods
The deposited micro-patterns were characterized by SEM, EDS, micro-Raman spectroscopy, and conductivity measurements.
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Power meter
PM100
Thorlabs
Measures the laser power after the objective lens.
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Optical beam shutter
SH1
Thorlabs
Controls the exposure time of the laser beam.
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HR-SEM
FEI, Magellan 400L system
FEI
Obtains high-resolution SEM images and EDS measurements.
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Micro-Raman spectra system
HR 800 Jobin Yvon system
HORIBA
Obtains Raman spectra of the deposited materials.
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Cryo-TEM
Tecnai G2
FEI
Obtains cryo-TEM images of the EB-PANI dispersion.
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Optical profilometer
LEXT, OLS4100
Olympus
Measures the width, height, and cross-sectional areas of the deposited micro-patterns.
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CW laser
Verdi G-Series Family
Used to focus a laser beam on the sample for microbubble formation and micro-patterning.
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Inverted microscope
Nikon Eclipse Ti-U
Nikon
Integrated with the laser for focusing and observing the micro-patterning process.
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DeltaPix camera
Records the experiments.
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SEM
Quanta FEG 250 System
Obtains SEM images of the deposited micro-patterns.
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