1：Experimental Design and Method Selection:

The study involved the deposition of ITO films with varying thicknesses (50 nm–476 nm) using RF magnetron sputtering and annealing at 180°C for 60min under air atmosphere. The optoelectronic properties of these films were then analyzed.

2：Sample Selection and Data Sources:

ITO films were prepared on SLG substrates. The thicknesses were varied by adjusting the sputtering time.

3：List of Experimental Equipment and Materials:

Equipment included RF-magnetron sputtering for ITO deposition, X-ray diffraction (XRD) for crystal structure analysis, FE-SEM for surface morphology, UV–Vis–NIR spectroscopy for optical reflectance, and Hall System for electrical properties measurement.

4：Experimental Procedures and Operational Workflow:

The process involved sputtering ITO layers on SLG substrates, annealing, and then characterizing the films for structural, optical, and electrical properties. The ITO layers were then applied in CZTS solar cells to study their impact on performance.

5：Data Analysis Methods:

The data were analyzed to determine the relationship between ITO film thickness and optoelectronic properties, as well as the performance of CZTS solar cells.