研究目的
To fabricate pure anatase phase titanium dioxide thin films using the mist chemical vapor deposition method and investigate the effects of deposition temperature and titanium tetraisopropoxide concentration on the structural properties of the films.
研究成果
Pure anatase phase TiO2 films with good uniformity were obtained from 300 ?C to 400 ?C. The best crystallinity was obtained at a TTIP concentration of 0.05 mol/L. The films have excellent potential to be applied to thin-film gas sensors.
研究不足
The study focuses on the synthesis and structural properties of TiO2 thin films. The application in gas sensors is mentioned but not extensively explored.
1：Experimental Design and Method Selection
The mist chemical vapor deposition method was used to synthesize pure anatase phase TiO2 thin films. The effects of deposition temperature and TTIP concentration on the structural properties of TiO2 films were investigated.
2：Sample Selection and Data Sources
TTIP was dissolved in ethanol to prepare a solution of precursor. Quartz glass was selected as a substrate.
3：List of Experimental Equipment and Materials
Mist CVD system consisting of two stages: a mist droplet source supply stage and a film deposition stage. Ultrasonic transducers with a frequency of 2.4 MHz were used. Spectroscopic ellipsometry, GIXRD, XPS, Raman spectroscopy, AFM, and FE-SEM were used for characterization.
4：Experimental Procedures and Operational Workflow
The deposition temperature was varied from 200 ?C to 400 ?C. The TTIP concentration was adjusted from 0.05 mol/L to 0.40 mol/L. The thickness of TiO2 thin films was measured, and the deposition rate was calculated.
5：Data Analysis Methods
The structural properties of TiO2 thin films were investigated using GIXRD, XPS, and Raman spectroscopy. The morphologies were evaluated by AFM and FE-SEM.
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GIXRD
ATX-G
Rigaku
Investigation of structural properties of TiO2 thin films
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FE-SEM
SU-8020
Hitachi
Evaluation of morphologies of thin films
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TTIP
Wako Pure Chemical Industries, Ltd.
Precursor for TiO2 thin film deposition
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Ethanol
Wako Pure Chemical Industries, Ltd.
Solvent for TTIP
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Spectroscopic ellipsometry
WVASE32
J.A. Woollam, Co., Inc.
Measurement of TiO2 thin film thickness
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XPS
AXIS-HS
Shimadzu/KRATOS
Analysis of surface chemical states and electronic structures of TiO2 films
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Raman spectroscopy
LabRAM HR-800
Horiba Jobin Yvon
Investigation of structural properties of TiO2 films
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AFM
Nano-R2
Pacific Nanotechnology
Evaluation of morphologies of thin films
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