研究目的
Investigating the effects of high temperature on key performance parameters of a 3C-SiC/Si ultraviolet (UV) photodetector (PD) for elevated temperature applications.
研究成果
The 3C-SiC UV photodetector demonstrated high sensitivity, fast response, and good stability at elevated temperatures up to 200°C, making it suitable for high-temperature photonic applications. The device's performance at low operating voltages and its cost-effective fabrication process are significant advantages.
研究不足
The study is limited by the temperature range (up to 200°C) and the specific wavelength of UV light (254 nm) used. The performance decrease at higher temperatures due to lattice scattering is also a limitation.
1:Experimental Design and Method Selection:
The study involved the fabrication and characterization of a 3C-SiC UV photodetector to investigate its performance at various temperatures and bias voltages.
2:Sample Selection and Data Sources:
A 3C-SiC thin film was grown on a p-type Si (001) wafer using a multi-step growth process in a metal organic chemical vapor deposition (MOCVD) reactor.
3:List of Experimental Equipment and Materials:
Equipment included a MOCVD reactor, SEM (Phenom XL, Phenom-World), XRD (Bruker D8 Discover), and a Keithley 2634B sourcemeter unit. Materials included hexamethyldisilane (HMDS), propane, H2, Ar, and gold (Au) for contacts.
4:Experimental Procedures and Operational Workflow:
The 3C-SiC film was grown, cleaned, and Au contacts were deposited. Electrical and optical measurements were conducted at temperatures from 50°C to 200°C and bias voltages from
5:5 V to 20 V. Data Analysis Methods:
The performance parameters such as sensitivity, rise time, decay time, and dark current were analyzed.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容