研究目的
Reviewing the state of the art on Reactive Ion Etching of Single Crystal Diamond by Inductively Coupled Plasma and providing a catalog of recipes.
研究成果
The broad range of applications of SCD involves different requirements in terms of etching rates, hard mask materials, selectivities and resulting surface qualities. This has resulted in a variety of SCD ICP-RIE processes from which one can select or adapt the most appropriate parameters. In this contribution, we summarize the most important parameters of SCD ICP-RIE, review the resulting characteristics of the obtained structures and present a catalog of SCD ICP-RIE recipes. We propose several guidelines to facilitate the selection of an adapted etching process, aiming to serve as an up to date reference 'toolkit' for researchers in the field.
研究不足
The technical and application constraints of the experiments, as well as potential areas for optimization.
