研究目的
Investigating the preparation of large-area fractal graphene and understanding its morphology evolution to improve catalytic performance.
研究成果
The study successfully prepared large-area fractal graphene films through a controlled etching process during CVD, providing insights into the morphology evolution and potential applications in electrocatalysis and electronic devices.
研究不足
The study focuses on the preparation and morphology evolution of fractal graphene on polycrystalline Cu substrates, with potential limitations in scalability and application in other substrates or conditions.
1：Experimental Design and Method Selection:
Low-pressure CVD method was used to prepare fractal graphene on Cu substrate, utilizing the etching effect of hydrogen in the cooling process.
2：Sample Selection and Data Sources:
Cu foils (25 μm, Alfa Aesar) were used as substrates.
3：List of Experimental Equipment and Materials:
CVD furnace (G-CVD Graphene Technology Company Limited, Xiamen), polymethyl methacrylate (PMMA), ammonium persulfate, acetone.
4：Experimental Procedures and Operational Workflow:
The process involved heating, annealing, introducing methane, cooling, and transferring graphene onto SiO2/Si substrates.
5：Data Analysis Methods:
SEM and optical microscopy for morphology observation, Raman spectroscopy and AFM for quality and layer characteristic analysis.
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