研究目的
Investigating the mechanism of laser-induced thinning of low-stress silicon nitride (SiNx) membranes and films for the fabrication of ultrathin asymmetric nanopores.
研究成果
The study provides a detailed understanding of the laser-induced etching mechanism of SiNx membranes and demonstrates a method for fabricating ultrasmall and ultrathin nanopores. These nanopores have potential applications in biomolecular analysis, including DNA sequencing and biomarker detection.
研究不足
The study is limited by the precision of laser focusing and the variability in SiNx membrane properties. The etching process is influenced by the surrounding environment and electrolyte composition, which may affect reproducibility.
1:Experimental Design and Method Selection:
Focused a visible wavelength laser beam on a SiNx membrane to study the mechanism of etching and thinning.
2:Sample Selection and Data Sources:
Used silicon chips with freestanding SiNx membranes.
3:List of Experimental Equipment and Materials:
Inverted microscope (Olympus IX71), Ag/AgCl electrodes, electro-optic modulator (EOM, Conoptics, 302RM), transmission electron microscopy (JEOL 2010F).
4:Experimental Procedures and Operational Workflow:
Applied voltage across the membrane, measured current changes, and used laser illumination to induce etching.
5:Data Analysis Methods:
Analyzed ion current changes, TEM images, and AFM measurements to determine etch rates and pore dimensions.
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