研究目的
Investigating the process for fabricating Si-cups and actuator membranes of multi-layered structures for piezoelectric inkjet print heads using deep reactive ion etching.
研究成果
The optimised multi-step DRIE process successfully fabricated high quality PIPH actuator membranes by controlling platen power and process duration, eliminating over-etching and improving Si-cup profiles. This contributes to the development of piezoelectric inkjet technology.
研究不足
The process requires optimization to avoid negative profiles of Si-cups and notching effect, and to prevent over-etching of SiO2 membranes.
1:Experimental Design and Method Selection:
Utilized deep reactive ion etching (DRIE) based on Bosch process for anisotropic profiles.
2:Sample Selection and Data Sources:
Used silicon on insulator (SOI) wafers and polymer SU-
3:List of Experimental Equipment and Materials:
DRIE system (ALCATEL AMS100SE), photoresist BN308, SF6 and C4F8 gases.
4:Experimental Procedures and Operational Workflow:
Multi-step DRIE process with varying parameters to etch Si-cups and avoid over-etching of SiO2 membranes.
5:Data Analysis Methods:
Optical photographs and vibrometer measurements to assess the quality of actuator membranes.
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