研究目的
To achieve electron microscopy inspection with high throughput and ultra-high resolution, electron beam systems require a high brightness electron source. This study focuses on designing, microfabricating, and testing arrays of metal coated silicon cold field emitters as a promising alternative to thermal field emitters, addressing the challenge of achieving stable emission current.
研究成果
Metal coated silicon cold field emitters present a promising alternative to Schottky emitters due to their ease of fabrication, low cost, reliability, high current densities, long lifetimes, and high reduced brightness. Pulsing an emitter significantly improves the emission stability, demonstrating beam currents with reduced noise.
研究不足
The main challenge is achieving stable emission current with cold field emitters, as adsorption or desorption of trace molecules in the vacuum onto the emitter tip surface can cause fluctuations in the beam current.
1：Experimental Design and Method Selection:
The emitters and extractor were modeled and designed using Munro’s Electron Beam Software. Silicon emitters were microfabricated using lithography, thin film deposition, diffusion, and etching.
2：Sample Selection and Data Sources:
Silicon wafers were used to create uniform arrays of nanometer scale tips.
3：List of Experimental Equipment and Materials:
Ultra-high vacuum chambers, 3-axis stage, Faraday cup with a phosphor screen, scanning transmission electron microscopy (STEM), and electron energy loss spectroscopy (EELS).
4：Experimental Procedures and Operational Workflow:
Field emission testing was conducted inside ultra-high vacuum chambers. Current maps were made by scanning the chip over the extractor and measuring the field emission current.
5：Data Analysis Methods:
Angular current intensity and reduced brightness were measured and compared with simulation results.
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