研究目的
Investigating the photosensitivity of single high-aspect-ratio silicon tips with different doping levels in an ultra-high vacuum environment.
研究成果
The study demonstrated that the current saturation level and photosensitivity of single HAR Si tips depend on the doping level and tip structure, such as the presence of a p/n junction. The current saturation level decreases with a higher doping level.
研究不足
The study was limited to single HAR Si tips under ultra-high vacuum conditions. The intrinsic HAR Si-tips showed unstable field emission behavior without clear evidence of photosensitivity.
1:Experimental Design and Method Selection:
The field emission properties of single HAR Si structures were investigated under ultra-high vacuum using a high-resolution field emission scanning microscope (FESM) with a tungsten tip anode.
2:Sample Selection and Data Sources:
Single HAR Si tips with different doping levels and integrated p/n junctions were fabricated.
3:List of Experimental Equipment and Materials:
High-resolution field emission scanning microscope (FESM), tungsten tip anode (? ≈ 8 μm), halogen lamp (RCC-T 150W).
4:Experimental Procedures and Operational Workflow:
The FE properties were measured at an anode-cathode surface gap of Δz = 35-45 μm. Ex-situ illumination was done with a halogen lamp.
5:Data Analysis Methods:
The current-voltage characteristics were analyzed, and the emission current was compared to the Fowler-Nordheim (FN) theory.
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