研究目的
To investigate the rapid deposition of flexible electrochromic tungsten/iron mixed oxide (WFexOyCz) films using an atmospheric pressure plasma jet (APPJ) and their electrochromic performance with the addition of oxygen gases.
研究成果
The study successfully demonstrated the rapid deposition of flexible electrochromic WFexOyCz films using an APPJ. The addition of oxygen gases at a specific flow rate enhanced the electrochromic performance, with significant coloration and bleaching observed. The films showed high optical transmittance modulation, optical density change, and color efficiency, making them suitable for flexible electrochromic devices.
研究不足
The study is limited to the specific conditions of the APPJ deposition process and the characterization of the electrochromic properties under the specified experimental setup.
1:Experimental Design and Method Selection:
A low temperature-atmospheric pressure-plasma polymerization method with an APPJ was used to deposit WFexOyCz films onto flexible PET/ITO substrates. The precursor vapors of tungsten hexacarbonyl and ferrocene were mixed with O2 gases at various flow rates and injected into the air plasma jet.
2:Sample Selection and Data Sources:
Flexible PET/ITO substrates were used. The films were characterized using Field Emission Scanning Electron Microscopy (FESEM), Raman Spectroscopy, and X-ray Photoelectron Spectroscopy (XPS).
3:List of Experimental Equipment and Materials:
APPJ setup, PET/ITO substrates, tungsten hexacarbonyl, ferrocene, O2 gases, 1 M LiClO4-propylene carbonate electrolyte.
4:Experimental Procedures and Operational Workflow:
The films were deposited at room temperature and atmospheric pressure with an exposed duration of 48 s. Electrochemical and optical characterizations were performed.
5:Data Analysis Methods:
The electrochromic performance was evaluated using cyclic voltammetry and spectrophotometry.
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Atmospheric Pressure Plasma Jet
APPJ
Deposition of WFexOyCz films onto flexible PET/ITO substrates
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Polyethylene Terephthalate/Indium Tin Oxide
PET/ITO
Substrate for film deposition
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Tungsten Hexacarbonyl
W(CO)6
Acros Organics
Precursor for tungsten in the film
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Ferrocene
Fe(C5H5)2
Acros Organics
Precursor for iron in the film
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Field Emission Scanning Electron Microscopy
FESEM
HITACHI S-4800
Inspection of surface morphology and thicknesses of the films
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Raman Spectrometer
Renishaw 1000B
Renishaw
Analysis of the structures of the films
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X-ray Photoelectron Spectroscopy
XPS
JEOL JAMP-9500F
Analysis of chemical compositions of the films
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Galvanostat
Jiehan 5000
Measurement of EC performances
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Spectrophotometer
Labguide DH2000-BAL
Measurement of transmittances
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