研究目的
To report on a turnstile-junction orthomode transducer (OMT) implemented by silicon micromachining in the 220 – 330 GHz band, focusing on design considerations, fabrication challenges, and performance metrics.
研究成果
The silicon micromachined turnstile OMT demonstrated superior performance in the 220 – 330 GHz band, with the best reported metrics for wideband OMTs in this frequency range. The study highlights the importance of anticipating and compensating for fabrication imperfections in the design phase.
研究不足
The device's sensitivity to geometrical variations and the challenge of achieving high RF performance due to fabrication imperfections like misalignment between chips.
1:Experimental Design and Method Selection:
The OMT was designed using CST Microwave Studio, considering fabrication imperfections like sidewall slopes and underetching.
2:Sample Selection and Data Sources:
Two OMT prototypes were fabricated and characterized.
3:List of Experimental Equipment and Materials:
SOI wafers, deep reactive ion etching (DRIE) tools, gold sputtering for metallization.
4:Experimental Procedures and Operational Workflow:
Fabrication involved DRIE of SOI wafers, metallization, and assembly of three-chip stacks.
5:Data Analysis Methods:
RF characterization was performed using a Rohde & Schwarz ZVA-24 VNA with ZC330 frequency extenders.
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