研究目的
Investigating the fabrication of large-scale homogeneous SERS substrates using a microwave annealing process on Ag thin films on silicon, focusing on the enhancement of Raman signal and the reusability of the substrates.
研究成果
The study successfully demonstrated the fabrication of large-scale homogeneous SERS substrates using a microwave annealing process, achieving a significant Raman signal enhancement and proving the substrates' reusability. This approach minimizes the cost and time of the procedure, offering a practical solution for SERS applications.
研究不足
The study is limited by the potential partial detachment of Ag nanoparticles during ultrasonic sonication, which affects the reusability of the substrates. The enhancement factor may be suppressed compared to other methods due to the low intensity of the incident laser beam used.
1：Experimental Design and Method Selection:
The study used a microwave annealing process on Ag thin films deposited on silicon wafers to fabricate SERS substrates. The method avoids the use of chemicals and stabilizing agents, focusing on a low-cost, efficient approach.
2：Sample Selection and Data Sources:
Ultra-thin layers of silver (2 nm, 4 nm, and 8 nm) were deposited on standard 4-inch n-type Si(100) wafers. The substrates were then exposed to microwave power for varying times (5, 10, and 15 s).
3：List of Experimental Equipment and Materials:
A UHV e-beam evaporator for Ag deposition, a domestic microwave oven for annealing, and a confocal micro-spectrometer for Raman measurements.
4：Experimental Procedures and Operational Workflow:
The Ag-coated Si substrates were annealed in a microwave oven, followed by characterization using SEM and Raman spectroscopy to evaluate the SERS performance and reusability.
5：Data Analysis Methods:
The size distribution of Ag nanoparticles was evaluated using ImageJ. The SERS enhancement factor was calculated based on Raman intensity measurements.
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