研究目的
Investigating the ferroelastic domain switching from the nonpolar b-axis to the polar c-axis oriented domain in HfO2-based epitaxial thin films and its implications for ferroelectricity.
研究成果
The study demonstrates that ferroelastic domain switching in HfO2-based epitaxial thin films can be induced by an electric field, leading to ferroelectric characteristics. This supports the conclusion that the ferroelectricity of HfO2 originates from its non-centrosymmetric orthorhombic phase.
研究不足
The study is limited to epitaxial thin films, and the findings may not directly apply to polycrystalline films. The mechanism of domain switching and its energy barriers require further investigation.
1:Experimental Design and Method Selection:
The study employs pulsed laser deposition (PLD) for film preparation, synchrotron X-ray diffraction (XRD), and scanning transmission electron microscopy (STEM) for structural analysis.
2:Sample Selection and Data Sources:
7%-YO
3:5-substituted HfO2 (YHO-7) epitaxial thin films on Sn-doped In2O3/(001)YSZ substrates. List of Experimental Equipment and Materials:
PLD system, synchrotron XRD, STEM, focused ion beam (FIB) technique.
4:Experimental Procedures and Operational Workflow:
Films were prepared by PLD, post-annealed, and characterized by XRD and STEM before and after applying an electric field.
5:Data Analysis Methods:
Analysis of XRD patterns and STEM images to determine domain orientation and switching.
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