研究目的
To develop a novel nanosynthesis strategy for ultrathin self-aligned silicon carbide (SiC) nanowire arrays with controlled density, orientation, and placement, and to integrate erbium ions for quantum information applications.
研究成果
The study successfully demonstrates a novel nanofabrication method for synthesizing ultrathin self-aligned SiC NW arrays with controlled properties and deterministic integration of erbium ions. This approach holds promise for applications in quantum information, sensing, and photonics.
研究不足
The study focuses on the fabrication and characterization of SiC NW arrays and their integration with erbium ions. Potential limitations include the scalability of the fabrication process and the optimization of ion implantation for different applications.
1:Experimental Design and Method Selection
The study employs a novel nanosynthesis strategy for SiC NW arrays using fabrication protocols compatible with silicon microelectronics. The methodology includes electron-beam lithography (EBL) for creating HSQ ribbon arrays, thermal chemical vapor deposition (CVD) for SiC deposition, and inductively coupled plasma reactive ion etching (ICP-RIE) for material removal.
2:Sample Selection and Data Sources
Clean Si (100) substrates were used for the fabrication of HSQ ribbon arrays. The study involves the synthesis of SiC or SiC:O on these arrays followed by thermal annealing.
3:List of Experimental Equipment and Materials
Equipment includes VB300 EBL system, Voyager system, thermal CVD setup, ICP-RIE system, and a home-built micro-PL system. Materials include hydrogen silsequioxane (HSQ), methyl isobutyl ketone (MIBK), tetra methyl ammonium hydroxide (TMAH), and CVD-742.
4:Experimental Procedures and Operational Workflow
The process involves spin-coating Si substrates with HSQ, exposure and development to create HSQ ribbon arrays, deposition of SiC or SiC:O via thermal CVD, ICP-RIE to remove undesired material, and wet-etch removal of HSQ ribbon arrays to yield SiC NW arrays.
5:Data Analysis Methods
Characterization techniques include FTIR, XPS, UV-VIS-SE, AFM, HR-STEM, and XRD for assessing material properties. PL measurements were conducted to evaluate the emission properties of Er-doped SiC:O NW arrays.
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Beamlock 2065
2065
Spectra-Physics
Argon laser for photoluminescence measurements
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FLSP920 spectrometer
FLSP920
Edinburgh Instruments
Spectrometer for photoluminescence measurements
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VB300 EBL system
VB300
Vistec Electron Beam GmbH
Electron-beam lithography for creating HSQ ribbon arrays
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Voyager system
Voyager
Raith GmbH
Electron-beam lithography for creating HSQ ribbon arrays
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Extrion 400 Ion Implanter
400
Extrion
Ion implantation for integrating erbium ions into SiC NW arrays
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