研究目的
To establish the dependence of the structure and the mechanical properties of ta-C coatings on the distance between the pulsed cathodic arc source and the substrate.
研究成果
The study demonstrated that the structure and mechanical properties of ta-C coatings can be controlled by adjusting the distance between the pulsed cathodic arc source and the substrate. The concentration of ordered aromatic rings decreases, while chain groups increase with distance, leading to changes in nanohardness and Young's modulus.
研究不足
The study is limited to the effects of distance on the properties of ta-C coatings prepared by pulsed cathodic arc deposition. The research does not explore other deposition parameters or their combined effects on the coatings' properties.
1：Experimental Design and Method Selection:
The ta-C films were deposited on silicon substrates using a pulsed cathodic arc source at three different distances (150, 215, and 265 mm) with a 27 mm aluminum diaphragm to limit the heat flux.
2：Sample Selection and Data Sources:
Silicon substrates were used, cleaned with ethanol and distilled water, and then purified with argon plasma.
3：List of Experimental Equipment and Materials:
Pulsed cathodic arc source, aluminum diaphragm, Raman spectroscopy (T64000, Horiba-Jobin Yvone), scanning electron microscopy (SEM, Hitachi S-4800), and a nanohardness tester (Nanoscan-4D).
4：Experimental Procedures and Operational Workflow:
Substrates were cleaned and cooled before deposition. Coatings were analyzed using Raman spectroscopy and SEM for structure and thickness, respectively. Mechanical properties were measured by nanoindentation.
5：Data Analysis Methods:
Raman spectra were analyzed for structural properties, and nanoindentation data were used to determine mechanical properties.
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