研究目的
To study the effect of the substrate temperature on the structural and morphological behavior of bismuth thin films deposited via dc-magnetron sputtering onto a glass substrate.
研究成果
The effect of substrate temperature on the structural and morphological behavior was studied for bismuth thin films grown on glass substrates via the dc-magnetron sputtering technique. A considerable influence of the substrate temperature on the microstructure was found. The increase of crystallite size with temperature and a drop in micro-stress were observed through the Williamson-Hall method. Morphological images showed the columnar growth of the thin films and grains with a polyhedral-like geometry. Segregation in Bi thin films was not observed in the range of substrate temperatures studied, but it may appear at higher temperatures, over 170°C.
研究不足
The study did not observe segregation in Bi thin films in the range of substrate temperatures studied, but it may appear at higher temperatures, over 170°C.
1：Experimental Design and Method Selection:
Bismuth monolayers were deposited via the dc magnetron sputtering technique using a bismuth target (
2：99%) 2 inches of diameter. Coatings were deposited on glass substrates, varying the substrate temperature from 100 to 160°C. Sample Selection and Data Sources:
The substrates were ultrasonically cleaned in acetone solution for 15 minutes and underwent a pretreatment through a plasma cleaning process that was carried out for 15 minutes before the deposition.
3：List of Experimental Equipment and Materials:
Bruker AXS D8 advanced X-Ray diffractometer (XRD), JEOL JXA-8530F Field Emission Electron Probe Microanalyzer (EPMA), Veeco Dektak 150 surface profilometer.
4：Experimental Procedures and Operational Workflow:
The deposition parameters used for the growth of the thin films were: base pressure of 10-4 Pa, work pressure of 6x10-3 Pa, 1 W/cm2 for power density, argon gas flow of 20 sccm and a deposition time of 20 minutes.
5：Data Analysis Methods:
Structural characterization was performed with XRD, using parallel beam geometry and a grazing incidence angle φ = 1.5° with Cu-kα radiation (λ = 1.5406 ?) ranging between 20-80° with steps of 0.02°. Cross section and morphological surface analyses were carried out using the EPMA with 10 keV of energy and a magnification of 50.000X.
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