研究目的
To introduce a three-intensity measurement technique in PSA ellipsometry and its application in measuring ellipsometric parameters for deducing optical parameters, and to develop a PEM ellipsometry for real-time monitoring of dynamically varying processes.
研究成果
The three-intensity measurement technique in PSA ellipsometry provides a simple and accurate method for measuring ellipsometric parameters. The development of PEM ellipsometry allows for real-time monitoring of dynamically varying processes with high precision. The technique has wide applications in measuring film thickness, refractive indices, and surface properties of various materials.
研究不足
The technique requires precise alignment of the azimuth angles of polarizer and analyzer. The speed of measurement in PSA ellipsometry is limited by the rotation of polarizer and analyzer. The PEM ellipsometry, while faster, requires a fast response detector due to the high modulation frequency of PEM.
1：Experimental Design and Method Selection:
The methodology involves the use of PSA ellipsometry and the insertion of a PEM for developing a PEM ellipsometry. The alignment of the azimuth angles of polarizer and analyzer to the incident plane is crucial.
2：Sample Selection and Data Sources:
The study involves measurements on various samples including SiO2/Si thin film, flat and curved surfaces, and anisotropic crystals.
3：List of Experimental Equipment and Materials:
Includes polarizer, analyzer, photoelastic modulator (PEM), charge-coupled device (CCD) as a detector, and various samples for measurement.
4：Experimental Procedures and Operational Workflow:
The process involves aligning the azimuth angles of polarizer and analyzer, measuring three intensities at specific angles, and analyzing the data to deduce ellipsometric parameters.
5：Data Analysis Methods:
The analysis involves comparing measured values with theoretical models to deduce optical parameters such as film thickness, refractive indices, and surface properties.
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