研究目的
Investigating a novel alignment method with nanoscale precision and hundreds of microns detecting range for proximity lithography.
研究成果
The proposed alignment method using complex grating based on moiré fringe achieves nanoscale precision in a hundred microns range, suitable for proximity lithography with super resolution. It simplifies the alignment structure and improves precision, applicable in fields requiring high precision like accurate positioning and vibration survey.
研究不足
The method requires correction of tilting and clocking of the fringe before use to avoid influence on alignment precision. Environmental disturbance and movement error are significant factors affecting the experiment's precision.
1：Experimental Design and Method Selection:
The study proposes an alignment method using complex grating based on moiré fringe for both coarse and ?nal alignments in proximity lithography.
2：Sample Selection and Data Sources:
Complex marks with periods P1, P2, and P3 are used for alignment.
3：List of Experimental Equipment and Materials:
Masks with chromium layer on quartz substrate, green LED light source, collimation, diaphragm, PZT stage (P-
4：1), imaging lens (MML8-ST110D-CM), CCD (WAT902H2). Experimental Procedures and Operational Workflow:
6 The method involves distinguishing coarse and ?nal alignment marks in frequency spectrum, calculating modulation and phase for alignment.
5：Data Analysis Methods:
Fourier transform is used to distinguish patterns by ?ltering in different directions, and modulation and phase are calculated for alignment.
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