研究目的
To apply the HiPIMS technique to the inverted magnetron in order to enhance the density of the energetic ions of both gas and metal species for the deposition of thin ferromagnetic films.
研究成果
The inverted magnetron operating in HiPIMS mode successfully provided a large flux of energetic ions, enhancing the thin film deposition process. The ion flux and deposition rate were significantly higher in HiPIMS mode compared to DC mode, with minimal back-attraction of ions to the cathode.
研究不足
The study focused on the deposition of nickel films and the enhancement of ion density using HiPIMS. The long-term stability and performance of the gapped magnetron configuration, especially in terms of plasma and thin film characterization, require further investigation.
1：Experimental Design and Method Selection:
The study employed high power impulse magnetron sputtering (HiPIMS) with positive discharge polarity using a gapped-target as the cathode. A DC pre-ionizer coupled to a HiPIMS unit was used to ignite and sustain the background plasma, with the main discharge power delivered by the HiPIMS unit.
2：Sample Selection and Data Sources:
The inverted magnetron was installed in an in-house coating system, with argon as the sputtering gas introduced to the chamber via a mass flow controller.
3：List of Experimental Equipment and Materials:
The magnetron consisted of a 410-grade stainless-steel anode and a gapped-nickel cathode. Equipment included a high voltage probe, a non-invasive current monitor, a digital oscilloscope, a planar electrical probe, and a quartz crystal microbalance (QCM).
4：Experimental Procedures and Operational Workflow:
The background plasma was initially ignited at a high pressure using the positive DC unit, then the argon flow rate was reduced to establish a designed process pressure before applying positive HiPIMS pulses to the magnetron.
5：Data Analysis Methods:
The waveforms of the discharge voltage and current were measured and analyzed to determine the discharge power. The ion fluxes and deposition rates were measured using a planar electrical probe and QCM, respectively.
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