研究目的
To understand and analyze the transport properties of different metal-insulator systems, specifically the electronic transport properties of AlF3 thin films deposited over a Cu(1 0 0) substrate, and to model systems composed by an AlF3 molecule between two metallic electrodes with different geometries.
研究成果
The study confirms that AlF3 acts as an effective insulating film in electronic heterostructures within the voltage range of ?2.5 to 5.0 V. Both experimental and theoretical results show low current values, indicating that AlF3 can be used as a thin insulating film for electronic applications. The transmission spectrum and density of states analysis provide insights into the electronic transport mechanisms.
研究不足
The theoretical calculations were limited to a bias voltage range of ?2.5 to 5.0 V, and the experimental setup was constrained by the operational range of the equipment. The study also acknowledges the challenge in reaching convergence for transport calculations at higher voltages.