研究目的
Investigating the impact of electric field induced spin–orbit coupling on spin relaxation of donor-bound electrons in silicon and exploring methods to mitigate this effect to achieve bulk-limit spin-relaxation times in nanoelectronic devices.
研究成果
The study demonstrates that electric field induced spin–orbit coupling can dominate spin relaxation of donor-bound electrons in silicon, significantly reducing spin lifetimes in nanoelectronic devices compared to bulk silicon. By carefully aligning the external magnetic field, the lifetime-limiting effect can be eliminated, achieving bulk-limit spin-relaxation times. This discovery has important implications for the design of future qubit architectures and opens new avenues for controlling spins via higher-order electromagnetic coupling.
研究不足
The study is limited by the specific conditions of the nanoelectronic device and the external electromagnetic environment. The findings may not be directly applicable to other systems or configurations without further investigation.
1:Experimental Design and Method Selection:
The study involved measuring spin-relaxation rates of an individual Si:P donor qubit within an atomically engineered nanoelectronic device under varying electric and magnetic field conditions.
2:Sample Selection and Data Sources:
A single Si:P donor qubit was placed in a nanoelectronic device, with spin-lattice relaxation rates measured over two separate thermal cycles.
3:List of Experimental Equipment and Materials:
The device was fabricated using STM-lithography on hydrogen-terminated Si(001)–2 × 1 surface, encapsulated with epitaxial silicon, and measured in a Leiden cryo-free three-axis vector field fridge.
4:Experimental Procedures and Operational Workflow:
Spin-lattice relaxation rates were measured by aligning the external magnetic field along different crystal axes and applying electric fields to the donor qubit.
5:Data Analysis Methods:
The data was analyzed to extract spin-relaxation rates and compared to theoretical models of spin–orbit coupling.
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