研究目的
Investigating the effects of thermal annealing temperature and atmosphere on the optical and electrical properties of ITO films prepared by RF magnetron sputtering.
研究成果
Highly transparent conducting ITO thin films with excellent optical and electrical properties were successfully prepared by RF magnetron sputtering and post-annealing in nitrogen atmosphere. The films annealed at 850 °C in nitrogen showed the best performance, making them suitable for optoelectronic device applications.
研究不足
The study is limited to the effects of annealing temperature and atmosphere on ITO films' properties. The application of these films in optoelectronic devices was not explored in depth.
1：Experimental Design and Method Selection:
ITO thin films were deposited on sapphire substrates by RF magnetron sputtering and post-deposition annealing under different ambient and temperatures.
2：Sample Selection and Data Sources:
Sapphire substrates were used for the deposition of ITO films.
3：List of Experimental Equipment and Materials:
RF magnetron sputtering system, rapid thermal annealing (RTA) system, X-ray diffractometry (XRD), atomic force microscopy (AFM), UV-VIS-NIR spectrophotometer, Hall Effect measurement system, four-point probe system.
4：Experimental Procedures and Operational Workflow:
ITO films were deposited at a substrate temperature of 500 °C, annealed in nitrogen, air, and oxygen at temperatures ranging from 500 to 950 °C for 1 min.
5：Data Analysis Methods:
Structural properties were characterized by XRD, surface morphologies by AFM, optical properties by UV-VIS-NIR spectrophotometer, and electrical properties by Hall Effect measurement system and four-point probe system.
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X-ray diffractometry (XRD)
X’pert Pro Powder
PANalytical
Characterization of the structural properties of ITO films.
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RF magnetron sputtering system
Deposition of ITO thin films on sapphire substrates.
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Rapid thermal annealing (RTA) system
Post-deposition annealing of ITO films under different ambient and temperatures.
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Atomic force microscopy (AFM)
My-scope plus
Nanofocus Co.
Investigation of the surface morphologies of the films.
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UV-VIS-NIR spectrophotometer
Jasco Corp.
Characterization of the optical properties of the films.
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Hall Effect measurement system
HMS 3000
Ecopia Corp.
Measurement of carrier concentration, carrier mobility, and resistivity.
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Four-point probe system
CMT-SR1000N
Evaluation of the sheet resistance of the films.
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