研究目的
To investigate the use of 2D layered GaSe nanosheets in memristors and memtransistors for potential low-power electronics applications.
研究成果
The fabricated three-terminal 2D GaSe memtransistors possess high performance with large switching ratios, ultralow threshold electric field, good endurance and long-term retention. Furthermore, the device demonstrates gate tunability in RS characteristics, suggesting the promising applications in multi-terminal electronic devices with low power consumption and complex functionalities.
研究不足
The switching mechanism in 2D layered materials may be relevant to a complex competition among several parameters including grain size, lateral area, and the interface between electrodes and active layer. It is difficult to fabricate the memory devices with channel length less than 10 μm by using photolithography since the chemical solutions used in photolithography could dramatically destroyed GaSe nanosheets.
1:Experimental Design and Method Selection:
Mechanically exfoliated 2D layered GaSe nanosheets were used to prepare GaSe based three-terminal memtransistors. Ag electrodes were fabricated with a stripe mask by using sputtering method. The thickness of electrodes is ~100 nm and the distance between the adjacent electrodes is ~30 μm.
2:Sample Selection and Data Sources:
2D layered GaSe nanosheets were prepared by mechanical exfoliation method.
3:List of Experimental Equipment and Materials:
Atomic force microscope (AFM, DI Nanocope 8), Raman spectroscopy (HORIBA JOBIN YVON, HR800), double channel Keithley 2636B SourceMeter.
4:Experimental Procedures and Operational Workflow:
The RS behaviors and transport properties were measured by double channel Keithley 2636B SourceMeter with a four-probe station system. All measurements were performed under air ambient at room temperature.
5:Data Analysis Methods:
The positive part of I–V curve was re-plotted using double-logarithmic coordinates to analyze the electrical properties.
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