研究目的
To investigate the morphological and structural properties of Gd0.1Ce0.9O1.95 layers deposited on crystalline (111) YSZ substrates by RF magnetron sputtering and the effects of annealing at different temperatures on these properties.
研究成果
The study concludes that sputter deposited Gd0.1Ce0.9O1.95 thin films on YSZ crystalline substrates show improved crystallinity with increasing annealing temperatures, with no significant inter-diffusion phenomena at the GDC/YSZ interface. The optimal annealing temperature is around 900°C.
研究不足
The study is limited to non-destructive characterization techniques and does not explore the stoichiometric composition of the top zone in detail due to its small thickness.
1:Experimental Design and Method Selection:
RF magnetron sputtering was used to deposit Gd
2:1Ce9O95 layers on crystalline (111) YSZ substrates. Samples were annealed at temperatures ranging from 600°C to 1300°C. Sample Selection and Data Sources:
Single crystal (111) YSZ substrates were used.
3:List of Experimental Equipment and Materials:
Bruker D2 Phaser for X-Ray Reflectivity measurements, XPert Pro PANalytical for X-Ray Diffraction measurements, Nanite AFM from Nanosurf for AFM measurements.
4:Experimental Procedures and Operational Workflow:
Samples were annealed in air atmosphere for 2 hours. AFM, XRD, and XRR measurements were performed to analyze morphological and structural properties.
5:Data Analysis Methods:
Data were analyzed to evaluate grain size, crystal structure, and interface properties.
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