研究目的
Investigating the photochemical application of gold films on dielectric surfaces to simplify the gilding technology.
研究成果
The photochemical method simplifies the technology of dielectrics gilding by enabling gold film formation at room temperature without a reducing agent, with over 97% of gold transitioning to the surface as metal.
研究不足
The method's applicability is limited to certain dielectric structures and allows obtaining only nano-sized films, which may narrow its field of application.
1：Experimental Design and Method Selection:
The study involves creating a sorption layer of gold chloride on dielectric surfaces by dipping samples in a gold chloride solution, followed by drying under direct sunlight to facilitate photochemical reactions.
2：Sample Selection and Data Sources:
Cotton textile samples were used, treated with a gold chloride solution, and then exposed to sunlight.
3：List of Experimental Equipment and Materials:
Scanning electron microscope ISM-6490-LV (JEOL, Japan) for studying the film's elementary composition.
4：Experimental Procedures and Operational Workflow:
Samples were dipped in gold chloride solution, dried under sunlight, and then analyzed for gold film formation.
5：Data Analysis Methods:
The degree of gold transition to the textile surface was analyzed using electron microscopy.
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