研究目的
Investigating the effect of electrolysis on the electronic properties of Se based multilayer films deposited on n-type silicon (Se/n-Si) and showing that conduction and photoresponse can be changed by electrolysis processing.
研究成果
Electrolysis processing can modify the electronic properties of Se/n-Si heterostructures, improving conduction current and photoresponse by altering carrier lifetimes. This method offers a novel approach to engineering heterostructure properties post-fabrication.
研究不足
The study focuses on the modification of electronic properties through electrolysis but does not extensively explore the optimization of electrolysis parameters for maximum efficiency or the long-term stability of the modified properties.
1:Experimental Design and Method Selection:
The study involved the fabrication of Se/n-Si heterostructures and their subsequent electrolysis in NaCl solution to modify electronic properties.
2:Sample Selection and Data Sources:
n-type Si wafers were used as substrates for depositing Se based multilayer films.
3:List of Experimental Equipment and Materials:
Equipment included a rotational evaporation chamber, HP4140B for IV measurements, HP4263A LCR meter for CV measurements, and a green LED for illumination. Materials included Se, As2Se3, NaCl solution, and n-type Si wafers.
4:Experimental Procedures and Operational Workflow:
The Se surface was used as an anode in NaCl solution electrolysis, followed by IV and CV measurements under dark and illuminated conditions.
5:Data Analysis Methods:
The effects of Cl introduction on carrier lifetimes were analyzed through changes in conduction current and photocurrent.
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