研究目的
Investigation of the influence of a copper substrate on the radiation tolerance of graphene and the modification of its properties under irradiation with charged particle beams.
研究成果
The study demonstrates the significant influence of the copper substrate on the radiation resistance of graphene. The choice of substrate is crucial for the development of graphene-based optoelectronic devices operating under enhanced radiation loading.
研究不足
The study focuses on the interaction of ion beams with graphene on copper substrates, and the results may not be directly applicable to other substrate materials or different irradiation conditions.
1：Experimental Design and Method Selection:
The study involved the interaction of a nanosecond high-intensity pulsed ion beam with thin graphene films on copper substrates. Raman spectroscopy was used to analyze the degree of graphene degradation. The role of the substrate in the structural degradation of graphene was modeled using the SRIM software package.
2：Sample Selection and Data Sources:
Graphene samples were prepared by CVD on copper substrates. The copper foil used was 25 μm thick with a purity of 99.8%.
3：8%.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: A Nanofinder He confocal microscope with laser excitation wavelength of 473 nm was used for Raman spectroscopy. A TEMP-type accelerator was used for PIB irradiation.
4：Experimental Procedures and Operational Workflow:
The samples were irradiated with a series of two successive pulses, with the period between pulses being ~2–3 s. The Raman spectra were recorded before and after irradiation to analyze the structural changes in graphene.
5：Data Analysis Methods:
The Raman spectra were analyzed to determine the degree of graphene degradation. The SRIM software was used to model the interaction of the ion beam with the graphene and copper substrate.
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