研究目的
Investigating the changes in structural and mechanical properties of magnetron sputtered Ce/Ti oxide thin films on Si (100) wafers with different Ce:Ti ratios.
研究成果
The mechanical properties of Ce/Ti oxide films are influenced by the Ce:Ti ratio, with pure cerium oxide showing the highest hardness and Young's modulus. Mixing with titanium oxide reduces hardness and grain size. Films exhibit high thermal stability up to 1000°C, and water contact angle is primarily affected by surface roughness rather than chemical composition. FEM modeling shows stress variations with different substrates and film thicknesses.
研究不足
The study is limited to specific Ce:Ti ratios and Si (100) substrates; potential discrepancies due to bias voltage variations are noted but not explored; surface contamination in XPS could affect results; FEM modeling assumes certain parameters that may not capture all real-world complexities.
1：Experimental Design and Method Selection:
The study uses magnetron sputtering for deposition, XPS and XRD for chemical and structural analysis, FESEM for morphology, nanoindentation for mechanical properties, FEM for stress modeling, and contact angle measurements for wettability.
2：Sample Selection and Data Sources:
Four samples with different Ce:Ti ratios (pure CeO2, pure TiO2, and two mixtures) deposited on Si (100) wafers.
3：List of Experimental Equipment and Materials:
TEER UDP 650/4 magnetron sputtering system, Kratos AXIS Ultra DLD XPS system, Rigaku Smartlab XRD machine with Anton Paar DHS110 furnace, Zeiss Neon 40EsB FESEM system, Cressington 208HR sputter coater, Ultra-Micro Indentation System 2000 with diamond Berkovich indenter, COMSOL Multiphysics software, FTA1000 Drop Shape Analysis instrument.
4：Experimental Procedures and Operational Workflow:
Substrates cleaned and dried, films deposited at controlled parameters, XPS and XRD scans performed, FESEM imaging done with platinum coating, nanoindentation tests conducted with load control, FEM models generated, contact angle measurements taken with water droplets.
5：Data Analysis Methods:
XPS data calibrated and peak-fitted, XRD phases identified, grain size calculated using linear intercept method, hardness and Young's modulus derived from nanoindentation, stress distributions analyzed in FEM, contact angles calculated using Drop Shape Analysis software.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
XPS system
AXIS Ultra DLD
Kratos
Surface chemistry analysis using X-ray photoelectron spectroscopy
-
X-ray diffraction machine
Smartlab
Rigaku
Structural analysis using X-ray diffraction, equipped with furnace for high-temperature studies
-
furnace
DHS110
Anton Paar
High-temperature heating for in-situ XRD experiments
-
FESEM system
Neon 40EsB CROSS-BEAM
Zeiss
Imaging surface morphology of films
-
software
COMSOL Multiphysics
COMSOL
Finite element modeling of stress distributions
-
drop shape analysis instrument
FTA1000
First Ten Angstroms
Measuring water contact angles
-
magnetron sputtering system
UDP 650/4
TEER
Deposition of Ce/Ti oxide thin film coatings
-
sputter coater
208HR
Cressington
Coating samples with platinum to improve conductivity for FESEM
-
nanoindentation workstation
Ultra-Micro Indentation System 2000
CSIRO
Measuring mechanical properties like hardness and Young's modulus
-
登录查看剩余7件设备及参数对照表
查看全部
