研究目的
Investigating the mechanism of the tip effect in an external field, specifically the influence of an electric field on the tip shape and a temperature field on the film uniformity of a micro-needle during diamond coating.
研究成果
The tip effect in external fields is caused by the movement of free electrons towards the tip due to curvature, leading to deformation in electric fields and poor film uniformity in temperature fields. This understanding can guide industrial applications to mitigate these effects by adjusting field parameters.
研究不足
The study is limited by the small size of the micro-needle, which hinders direct temperature measurement. The ANSYS simulation did not fully capture the temperature gradient observed experimentally, indicating potential inaccuracies in modeling. The research focuses on specific external fields and may not generalize to all coating processes.
1：Experimental Design and Method Selection:
The study used a two-step deposition process: magnetron sputtering for a TiN transitional layer to investigate the electric field effect, and hot-filament chemical vapor deposition (HFCVD) for a diamond layer to investigate the temperature field effect. The rationale was to explore how external fields affect tip deformation and film uniformity.
2：Sample Selection and Data Sources:
The substrate was a high-speed steel micro-needle with specific dimensions and composition. Samples were selected based on standard industrial use, and data came from optical microscopy, SEM observations, and ANSYS simulations.
3：List of Experimental Equipment and Materials:
Equipment included a medium-frequency magnetron sputtering system, an HFCVD reactor, an optical microscope, SEM, and ANSYS software. Materials included the micro-needle, Ti target, gases (Ar, N2, CH4, H2), and cleaning solvents (ethanol, acetone).
4：Experimental Procedures and Operational Workflow:
For magnetron sputtering, the substrate was cleaned ultrasonically, placed in a vacuum chamber, and TiN films were deposited with varying bias voltages. For HFCVD, the substrate was cleaned, placed in the reactor, and diamond films were deposited with varying filament-substrate distances. Observations and simulations were conducted post-deposition.
5：Data Analysis Methods:
Data were analyzed using optical microscopy for morphology, SEM for grain size, and ANSYS for temperature field simulation. Statistical analysis of grain sizes and theoretical calculations of electric forces were performed.
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