1：Experimental Design and Method Selection:

The study designs experiments to compare particle-added and non-particle-added black photoresists, using photolithography to pattern them and evaluate properties like reflectance and line edge roughness. Theoretical models involve solvent interactions for matte surface formation.

2：Sample Selection and Data Sources:

Base black photoresists are prepared or obtained commercially (e.g., BPR-3 from Consistent Electronic Materials Inc.), with additions of special substances like PVP. Samples include Matte Black Photoresist-1, -2, and -

3：List of Experimental Equipment and Materials:

Equipment includes spinner (Mikasa), direct hot plate, broad band aligner (Mikasa MA-20), OD meter, optical microscope, SEM, confocal microscope. Materials include acrylic polymer, monomer, photo-initiator, carbon black paste, solvents (PGMEA, methanol, IPA), PVP, micron-size particles (e.g., HIPRECICA from UBE EXSYMO CO., LTD.).

4：Experimental Procedures and Operational Workflow:

Photoresists are coated on glass wafers via spin coating, dried, exposed to UV light through a mask, developed with alkaline solution, and baked. Performance is checked through measurements of optical density, pattern profile, edge roughness, surface roughness, and reflectance.

5：Data Analysis Methods:

Data is analyzed using instruments like OD meter, microscopes, and SEM for qualitative and quantitative assessment of photoresist properties.